Gas Velosity and Mass Flowrate Scaling Modeling in Microelectronics’ Thermal Control Systems
| dc.contributor.author | B. V. Kosoy, Y. Utaka | |
| dc.date.accessioned | 2018-12-19T14:41:22Z | |
| dc.date.available | 2018-12-19T14:41:22Z | |
| dc.date.issued | 2018 | |
| dc.description.abstract | In the present research we investigate pressure driven flow in the transition and free-molecular flow regimes with the objective of developing unified flow models for microchannels. These models are based on a velocity scaling law, which is valid for a wide range of Knudsen number. Simple slip-based descriptions of flowrate in microchannels are corrected for effects in the transition and free-molecular flow regimes with the introduction of a rarefaction factor. The resulting models can predict the velocity distribution, mass flowrate, pressure and shear stress distribution in rectangular microchannels in the entire Knudsen flow regime. | |
| dc.identifier.issn | 0453-8307 | |
| dc.identifier.uri | https://card-file.ontu.edu.ua/handle/123456789/6480 | |
| dc.identifier.uri | https://doi.org/10.15673/ret.v53i6.923 | |
| dc.source | Refrigeration Engineering and Technology | |
| dc.title | Gas Velosity and Mass Flowrate Scaling Modeling in Microelectronics’ Thermal Control Systems |